高絨度摻硼氧化鋅透明導(dǎo)電薄膜用作非晶硅太陽電池前電極的研究
發(fā)布時(shí)間:2018-10-25 16:40
【摘要】:將自行研制的具有優(yōu)異陷光能力的摻硼氧化鋅用作p-i-n型非晶硅太陽電池的前電極,并且將傳統(tǒng)商業(yè)用U型摻氟二氧化錫作為對比電極.相比表面較為平滑的摻氟二氧化錫,摻硼氧化鋅表面大類金字塔的絨面結(jié)構(gòu)會(huì)在本征層生長過程中觸發(fā)陰影效應(yīng),形成大量的高缺陷材料區(qū)和漏電溝道,進(jìn)而惡化電池的開路電壓和填充因子.在不修飾摻硼氧化鋅表面形貌的情況下,通過調(diào)節(jié)非晶硅本征層的沉積溫度來消弱高絨度表面形貌引起的這種不利影響,對應(yīng)的電池開路電壓和填充因子均出現(xiàn)提升.在僅有鋁背電極的情況下,在本征層厚度為200 nm的情況下,以摻硼氧化鋅為前電極的非晶硅太陽電池轉(zhuǎn)換效率達(dá)7.34%(開路電壓為0.9 V,填充因子為70.1%,短路電流密度11.7 mA/cm2).
[Abstract]:The prepared zinc oxide doped boron oxide with excellent light trapping ability was used as the front electrode of p-i-n amorphous silicon solar cell and the traditional commercial use of U type doped tin dioxide as contrast electrode. Compared with fluoride-doped tin dioxide with a smoother surface, the flannel structure of the pyramids on the surface of zinc oxide doped with boron will trigger the shadow effect during the growth of the intrinsic layer, resulting in a large number of high defect material areas and leakage channels. In turn, the open circuit voltage and filling factor of the battery are worsened. Without modifying the surface morphology of zinc oxide doped with boron, by adjusting the deposition temperature of the intrinsic layer of amorphous silicon to attenuate the adverse effect caused by the surface morphology of high velvet, the corresponding open circuit voltage and filling factor of the battery are increased. When the thickness of the intrinsic layer is 200 nm, the conversion efficiency of amorphous silicon solar cells with boron doped zinc oxide as the front electrode is 7.34% (open circuit voltage is 0.9 V, filling factor is 70.1, short-circuit current density is 11.7 mA/cm2).
【作者單位】: 南開大學(xué)信息科學(xué)與技術(shù)學(xué)院光電子薄膜器件與技術(shù)研究所;
【基金】:國家重點(diǎn)基礎(chǔ)研究發(fā)展計(jì)劃(批準(zhǔn)號(hào):2011CBA00706,2011CBA00707) 國家自然科學(xué)基金(批準(zhǔn)號(hào):60976051) 國家高技術(shù)研究發(fā)展計(jì)劃(批準(zhǔn)號(hào):2013AA050302) 天津市科技支撐項(xiàng)目(批準(zhǔn)號(hào):12ZCZDGX03600) 天津市重大科技支撐計(jì)劃項(xiàng)目(批準(zhǔn)號(hào):11TXSYGX22100) 高等學(xué)校博士學(xué)科點(diǎn)專項(xiàng)科研基金(批準(zhǔn)號(hào):20120031110039)資助的課題~~
【分類號(hào)】:TM914.41
[Abstract]:The prepared zinc oxide doped boron oxide with excellent light trapping ability was used as the front electrode of p-i-n amorphous silicon solar cell and the traditional commercial use of U type doped tin dioxide as contrast electrode. Compared with fluoride-doped tin dioxide with a smoother surface, the flannel structure of the pyramids on the surface of zinc oxide doped with boron will trigger the shadow effect during the growth of the intrinsic layer, resulting in a large number of high defect material areas and leakage channels. In turn, the open circuit voltage and filling factor of the battery are worsened. Without modifying the surface morphology of zinc oxide doped with boron, by adjusting the deposition temperature of the intrinsic layer of amorphous silicon to attenuate the adverse effect caused by the surface morphology of high velvet, the corresponding open circuit voltage and filling factor of the battery are increased. When the thickness of the intrinsic layer is 200 nm, the conversion efficiency of amorphous silicon solar cells with boron doped zinc oxide as the front electrode is 7.34% (open circuit voltage is 0.9 V, filling factor is 70.1, short-circuit current density is 11.7 mA/cm2).
【作者單位】: 南開大學(xué)信息科學(xué)與技術(shù)學(xué)院光電子薄膜器件與技術(shù)研究所;
【基金】:國家重點(diǎn)基礎(chǔ)研究發(fā)展計(jì)劃(批準(zhǔn)號(hào):2011CBA00706,2011CBA00707) 國家自然科學(xué)基金(批準(zhǔn)號(hào):60976051) 國家高技術(shù)研究發(fā)展計(jì)劃(批準(zhǔn)號(hào):2013AA050302) 天津市科技支撐項(xiàng)目(批準(zhǔn)號(hào):12ZCZDGX03600) 天津市重大科技支撐計(jì)劃項(xiàng)目(批準(zhǔn)號(hào):11TXSYGX22100) 高等學(xué)校博士學(xué)科點(diǎn)專項(xiàng)科研基金(批準(zhǔn)號(hào):20120031110039)資助的課題~~
【分類號(hào)】:TM914.41
【參考文獻(xiàn)】
相關(guān)期刊論文 前2條
1 陳新亮;薛俊明;張德坤;孫建;任慧志;趙穎;耿新華;;襯底溫度對MOCVD法沉積ZnO透明導(dǎo)電薄膜的影響[J];物理學(xué)報(bào);2007年03期
2 王利;張曉丹;楊旭;魏長春;張德坤;王廣才;孫建;趙穎;;非晶硅太陽電池BZO/p-a-SiC:H接觸特性改善的研究[J];物理學(xué)報(bào);2013年05期
【共引文獻(xiàn)】
相關(guān)期刊論文 前10條
1 朱仁江;;氬氧比對RF磁控濺射制備ZnO薄膜的影響[J];重慶科技學(xué)院學(xué)報(bào)(自然科學(xué)版);2008年03期
2 楊玲;韋帥;張婷婷;許積文;王華;;超聲噴霧熱解法制備ZnO:Al薄膜及其光電性能研究[J];材料導(dǎo)報(bào);2013年24期
3 宋晨辰;趙占霞;馬忠權(quán);趙磊;孟凡英;;濺射壓強(qiáng)對Sc摻雜ZnO薄膜絨面結(jié)構(gòu)的影響[J];光電子技術(shù);2014年01期
4 關(guān)國堅(jiān);甘志銀;;基于紅外測溫法的MOCVD工藝溫度分析[J];計(jì)量與測試技術(shù);2012年04期
5 袁艷紅;趙華;陳銳;王相虎;林t,
本文編號(hào):2294277
本文鏈接:http://www.wukwdryxk.cn/kejilunwen/dianlilw/2294277.html
最近更新
教材專著