發(fā)布時間：2018-12-20 22:31

【摘要】：光刻機是超大規(guī)模集成電路制造的核心設(shè)備,浸沒式光刻技術(shù)是一種基于傳統(tǒng)的干式光刻設(shè)備的改造的光刻技術(shù),業(yè)界普遍認可浸沒式光刻技術(shù)作為半導(dǎo)體特征尺寸45nnl節(jié)點及以下的新一代的光刻技術(shù),在半導(dǎo)體行業(yè)受到極大關(guān)注。浸沒式光刻通過在鏡頭和硅片之間填充一層完整的浸沒液體縫隙流場,從而改變了激光的光學(xué)折射介質(zhì)。為了保證浸沒液體穩(wěn)定良好的光學(xué)性能和縫隙流場穩(wěn)定快速的形成,這就要求浸沒液體具有超高的純度并能及時的得到更新,否則就會導(dǎo)致的曝光缺陷影響光刻成品率。當(dāng)前浸沒式光刻機均以超高純度的超純水作為理想的浸沒液,采用浸液注入控制系統(tǒng)對制備出的超純水進行流體動力學(xué)性能的調(diào)制,保證其能滿足浸沒液體縫隙流場的穩(wěn)定快速的形成需求,同時不對超純水產(chǎn)生污染。浸液注入控制系統(tǒng)中關(guān)于流體的流量控制效果將對縫隙流場的穩(wěn)定形成有重要的影響。本文以對浸沒式光刻機中使用到的浸液注入控制系統(tǒng)為研究對象,進行了浸液注入控制系統(tǒng)的設(shè)計和相關(guān)的控制分析,主要的工作包括以下幾點。(1)分析了浸沒式光刻機中使用到的浸液注入控制系統(tǒng)的工作需求,并依此設(shè)計了浸液注入控制系統(tǒng)的功能樣機,包括原理設(shè)計,元器件選型,電氣設(shè)計,控制柜加工設(shè)計,控制系統(tǒng)搭建等工作。(2)使用浸液注入控制系統(tǒng)功能樣機完成了與超純水制備系統(tǒng)以及非接觸密封裝置的聯(lián)合調(diào)試實驗。通過對調(diào)試實驗過程中出現(xiàn)的問題的分析,進一步量化了浸液注入控制系統(tǒng)關(guān)于流量控制的相關(guān)指標(biāo),并指出了相關(guān)指標(biāo)對縫隙流場形成狀態(tài)的影響。(3)通過對浸液注入控制系統(tǒng)中流體控制單元的分析明確了純時滯環(huán)節(jié)對于該流量控制方面造成的影響。同時采用理論以及仿真兩種形式對如何消除純滯后環(huán)節(jié)這種現(xiàn)象進行了相關(guān)的研究。在此基礎(chǔ)上設(shè)計了一款模糊變增益Smith預(yù)估控制器使得我們能夠使用Smtih預(yù)估器消除在控制過程中純滯后環(huán)節(jié)的影響。(4)通過將設(shè)計的控制算法采用計算機語言實現(xiàn)并運用在浸液注入控制系統(tǒng)上做了四組實驗,一方面驗證了仿真分析的正確性,另一方面也使用實際數(shù)據(jù)證明了該種控制器在實際運用過程中具有的優(yōu)點。并與超純水制備設(shè)備及非接觸密封裝置聯(lián)調(diào)證明了該種控制器對流量控制的積極作用及對縫隙流場形成的積極作用。
[Abstract]:Lithography machine is the core equipment of VLSI manufacturing. Immersion lithography technology is a kind of lithography technology based on the transformation of traditional dry lithography equipment. Immersion lithography technology is widely accepted as a new generation lithography technology for semiconductor feature size 45nnl nodes and below, which has attracted great attention in semiconductor industry. Immersion lithography changes the optical refraction medium of the laser by filling a layer of flow field between the lens and the silicon wafer with a complete submerged liquid slot. In order to ensure the stable optical properties of the submerged liquid and the stable and rapid formation of the slot flow field, it is required that the immersion liquid has ultra-high purity and can be updated in time, otherwise, the exposure defects will affect the yield of lithography products. At present, ultrapure water is used as ideal immersion solution in immersion lithography machine, and the hydrodynamic performance of the prepared ultrapure water is modulated by immersion injection control system. It can meet the demand of steady and fast formation of submerged liquid gap flow field and not pollute the ultra-pure water. The flow control effect of the fluid in the immersion injection control system will have an important effect on the steady formation of the slot flow field. In this paper, the design and analysis of the immersion injection control system used in immersion lithography are carried out. The main work includes the following points. (1) the working requirements of the immersion injection control system used in the immersion lithography are analyzed, and the functional prototype of the immersion injection control system is designed, including the principle design, the selection of components and devices. Electrical design, control cabinet processing design, control system construction and other work. (2) the use of immersion injection control system functional prototype to complete the ultra-pure water preparation system and non-contact sealing device joint debugging experiment. Through the analysis of the problems in the process of debugging experiment, the related indexes about flow control of the immersion injection control system are further quantified. The influence of relative indexes on the formation state of slot flow field is pointed out. (3) through the analysis of the fluid control unit in the immersion injection control system, the influence of pure time delay on the flow control is clarified. At the same time, theoretical and simulation methods are used to study how to eliminate the phenomenon of pure lag. On the basis of this, a fuzzy variable gain Smith predictor is designed, which enables us to use the Smtih predictor to eliminate the influence of pure delay in the control process. (4) the computer language is used to design the control algorithm. Four groups of experiments were carried out on the immersion injection control system. On the one hand, the correctness of the simulation analysis is verified; on the other hand, the advantages of the controller in practical application are proved by using the actual data. Combined with the ultra-pure water preparation equipment and the non-contact sealing device, the positive effect of the controller on the flow control and the formation of the slot flow field is proved.
【學(xué)位授予單位】：浙江大學(xué)
【學(xué)位級別】：碩士
【學(xué)位授予年份】：2015
【分類號】：TN305.7

【相似文獻】

相關(guān)期刊論文 前2條

1 肖華利;用“H”試劑從氧化鋅酸浸液中回收鍺的試驗研究[J];稀有金屬與硬質(zhì)合金;1998年02期

2 ;[J];;年期

相關(guān)碩士學(xué)位論文 前8條

1 張志杰;浸液控制系統(tǒng)中通信方案的設(shè)計與實現(xiàn)[D];浙江大學(xué);2015年

2 陳伊驊;非接觸密封裝置浸液注入控制分析[D];浙江大學(xué);2015年

3 陳學(xué)文;高鐵生物堆浸液回收銅新工藝研究[D];中南大學(xué);2010年

4 孫召明;從低品位礦堆浸液中分離回收銅鎳[D];中南大學(xué);2004年

5 張偉建;浸液式高速往復(fù)走絲電火花線切割關(guān)鍵技術(shù)研究[D];南京航空航天大學(xué);2013年

6 薛麗華;從含釩鋼渣酸浸液中萃取釩的試驗研究[D];昆明理工大學(xué);2008年

7 王一;石煤提釩酸浸液萃取工藝及乳化現(xiàn)象研究[D];武漢科技大學(xué);2013年

8 馬藝騫;石煤酸浸液釩分離富集制備精釩新工藝[D];中南大學(xué);2014年

，

本文編號：2388522